July, 2006
Introducing 3-Day Seminars:
Pattern Development and Grading For Fit
[TC]² announces upcoming Pattern Development and Grading for Fit 3-day seminars.
Pattern Development – October 18-20, 2006 (Tuition: $795; $495 for [TC]² Members)
A prerequisite for Grading for Fit, Pattern Development is a comprehensive course guiding each participant through the process of developing the best patterns for the garment industry.
Learn introductory principles of fit, pattern development, and marker making. Hands-on activities include flat pattern manipulations, fabric critique, and garment investigation.
This program is designed for beginning Patternmakers, Specifications and Costing Engineers, Spreaders and Cutters, Sewing Supervisors, and Merchandisers.
Grading for Fit – November 15-17, 2006 (Tuition: $795; $495 for [TC]² Members)
Do you want to increase your skills in patternmaking and fitting? Grading for Fit logically follows Pattern Development, a prerequisite for this course in most cases. Attendees should understand patternmaking, general grading principles and basic CAD functions. This program is designed for Patternmakers, Marker Makers, Specification and Costing Engineers, and Graders. (Please use this form for prerequisite questions).
Proper grading ensures good fit of a manufactured garment. Learn basic principles of fit and grading. Hands-on projects include deriving grade rules and manual grading of three basic garment types.
Registration: To register for either or both of these courses, please contact Elizabeth Salisbury, Program Coordinator at (919) 653-3507 or use this form.
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